Mochi, I.: search on Z-Library

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1

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Upadhyaya, Mihir, Jindal, Vibhu, Basavalingappa, Adarsh, Herbol, Henry, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, Pistor, Thomas V.,

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 5.09 MB

english, 2015

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic imaging of native and programmed defects on a full-field mask

Mochi, I., Goldberg, K. A., La Fontaine, B., Tchikoulaeva, A., Holfeld, C., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.46 MB

english, 2010

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Mochi, Iacopo, La Fontaine, Bruno M., Naulleau, Patrick P., Goldberg, Kenneth A., Xie, Ryan, Yan, Pei-Yang, Yamazoe, Kenji

Year:

2011

Language:

english

File:

PDF, 3.97 MB

english, 2011

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

La Fontaine, Bruno M., Huh, Sungmin, Ren, Liping, Chan, David, Wurm, Stefan, Goldberg, Kenneth, Mochi, Iacopo, Nakajima, Toshio, Kishimoto, Masahiro, Ahn, Byungsup, Kang, Inyong, Park, Joo-on, Cho, Ky

Year:

2010

Language:

english

File:

PDF, 977 KB

english, 2010

5

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Mochi, Iacopo, Helfenstein, Patrick, Mohacsi, Istvan, Rajeev, Rajendran, Kazazis, Dimitrios, Yoshitake, Shusuke, Ekinci, Yasin

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 2.35 MB

english, 2017

6

Notes en marge à « De l'Explication dans les Sciences » de M. Meyerson, et à « La Morale et la Science des Mœurs » de M. Lévy-Bruhl

Journal:

Revue philosophique de la France et de l étranger

Year:

1929

Language:

french

File:

PDF, 2.30 MB

french, 1929

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

Sanchez, Martha I., Ukraintsev, Vladimir A., Rajendran, Rajeev, Mochi, Iacopo, Helfenstein, Patrick, Mohacsi, Istvan, Redford, Sophie, Mozzanica, Aldo, Schmitt, Bernd, Yoshitake, Shushuke, Ekinci, Yas

Year:

2017

Language:

english

File:

PDF, 1.85 MB

english, 2017

8

Les bases morales de la science positive

Journal:

Revue philosophique de la France et de l étranger

Year:

1927

Language:

french

File:

PDF, 1.66 MB

french, 1927

9

[IEEE IGARSS 2000. IEEE 2000 International Geoscience and Remote Sensing Symposium. Taking the Pulse of the Planet: The Role of Remote Sensing in Managing the Environment - Honolulu, HI, USA (24-28 July 2000)] IGARSS 2000. IEEE 2000 International Geoscience and Remote Sensing Symposium. Taking the Pulse of the Planet: The Role of Remote Sensing in Managing the Environment. Proceedings (Cat. No.00CH37120) - A new technique for the data fusion of iper-spectral measurements

Bartoloni, A., Colandrea, P., Greco, B., Mochi, M., Pasquali, F.

Year:

2000

Language:

english

File:

PDF, 289 KB

english, 2000

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

Goldberg, Kenneth A., La Fontaine, Bruno M., Naulleau, Patrick P., Mochi, Iacopo, Rekawa, Senajith B., Smith, Nathan S., Macdougall, James B., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.00 MB

english, 2011

11

Microdrill, CO2-Laser, and Piezoelectric Stapedotomy

Cuda, Domenico, Murri, Alessandra, Mochi, Paolo, Solenghi, Tommaso, Tinelli, Nicoletta

Journal:

Otology & Neurotology

Year:

2009

Language:

english

File:

PDF, 298 KB

english, 2009

12

Resíduos e subprodutos agroindustriais e grãos como substratos para produção do fungo entomapatogênico Lecanicillium lecanii

Machado, Ana Carolina Ribeiro, Monteiro, Antonio Carlos, Mochi, Dinalva Alves, Yoshida, Luciana

Journal:

Year:

2009

File:

PDF, 172 KB

2009

13

Virulence factors and clinical patterns of multiple-clone hypermucoviscous KPC-2 producing K. pneumoniae

Vargas, J.M., Moreno Mochi, M.P., Nuñez, J.M., Cáceres, M., Mochi, S., del Campo Moreno, R., Jure, M.A.

Journal:

Year:

2019

Language:

english

File:

PDF, 498 KB

english, 2019

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

15

Teer, Peeh, Asphalt

A. Spilker, A. Stock, H. Mallison, P. H. Walker, G. M. Green, F. J. Nellensteyn, J. C. M. Sauerbier, E. Naumann, W. Teuscher, K. A. Hoepfner, H. Metzger, I. Ubaldini, O. Mochi, P. K. Breuer, H. Broche

Journal:

Analytical and Bioanalytical Chemistry

Year:

1933

Language:

german

File:

PDF, 809 KB

german, 1933

16

[IEEE 2015 IEEE International Conference on Communication Software and Networks (ICCSN) - Chengdu (2015.6.6-2015.6.7)] 2015 IEEE International Conference on Communication Software and Networks (ICCSN) - BMA: Bandwidth allocation management for distributed systems under cloud gaming

Runze Wang,, Mochi Xue,, Kai Chen,, Zhanqiang Li,, Tao Dong,, Youkai Sun,

Year:

2015

Language:

english

File:

PDF, 613 KB

english, 2015

17

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Investigation of buried EUV mask defect printability using actinic inspection and fast simulation

Clifford, Chris H., Zurbrick, Larry S., Montgomery, M. Warren, Chan, Tina T., Neureuther, Andrew R., Goldberg, Kenneth A., Mochi, Iacopo, Liang, Ted

Year:

2009

Language:

english

File:

PDF, 729 KB

english, 2009

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

George, Simi A., Naulleau, Patrick P., Gullikson, Eric M., Mochi, Iacopo, Salmassi, Farhad, Goldberg, Kenneth A., Anderson, Erik H., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 376 KB

english, 2011

19

Pérdida de Ozono en Líneas de Flujo Poliméricas: PVC y Silicona

Cremasco, Marco A, Tomaz, Edson, Mochi, Vanessa T, Vergel, Carlos F

Journal:

Información tecnológica

Year:

2013

File:

PDF, 162 KB

2013

20

Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror

Sheng Yuan, Kenneth A. Goldberg, Valeriy V. Yashchuk, Richard Celestre, Wayne R. McKinney, Gregory Morrison, James Macdougall, Iacopo Mochi, Tony Warwick

Journal:

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Year:

2011

Language:

english

File:

PDF, 633 KB

english, 2011

21

Fluorescence lidar imaging of the cathedral and baptistery of Parma

D. Lognoli, G. Cecchi, I. Mochi, L. Pantani, V. Raimondi, R. Chiari, T. Johansson, P. Weibring, H. Edner, S. Svanberg

Journal:

Applied Physics B: Lasers and Optics

Year:

2003

Language:

english

File:

PDF, 768 KB

english, 2003

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - State-of-the-art EUV materials and processes for the 7nm node and beyond

Panning, Eric M., Goldberg, Kenneth A., Buitrago, Elizabeth, Meeuwissen, Marieke, Yildirim, Oktay, Custers, Rolf, Hoefnagels, Rik, Rispens, Gijsbert, Vockenhuber, Michaela, Mochi, Iacopo, Fallica, Rob

Year:

2017

Language:

english

File:

PDF, 1.15 MB

english, 2017

23

Evolution of green lacewings (Neuroptera: Chrysopidae): an anchored phylogenomics approach

Winterton, Shaun L., Gillung, Jessica P., Garzón-Orduña, Ivonne J., Badano, Davide, Breitkreuz, Laura C.V., Duelli, Peter, Engel, Michael S., Liu, Xingyue, Machado, Renato J.P., Mansell, Mervyn, Mochi

Journal:

Systematic Entomology

Year:

2019

Language:

english

File:

PDF, 936 KB

english, 2019

24

Coherent diffractive imaging methods for semiconductor manufacturing

Helfenstein, Patrick, Mochi, Iacopo, Rajeev, Rajendran, Fernandez, Sara, Ekinci, Yasin

Journal:

Advanced Optical Technologies

Year:

2017

Language:

english

File:

PDF, 4.05 MB

english, 2017

25

The Numerical Solution of an Inverse Problem for a Class of One-Dimensional Diffusion Equations with Piecewise Constant Coefficients

Giordana, Claudia, Mochi, Marina, Zirilli, Francesco

Journal:

SIAM Journal on Applied Mathematics

Year:

1992

Language:

english

File:

PDF, 1.07 MB

english, 1992

26

The Numerical Solution of an Inverse Problem for a Class of One-Dimensional Diffusion Equations with Piecewise Constant Coefficients

Claudia Giordana, Marina Mochi and Francesco Zirilli

Journal:

SIAM Journal on Applied Mathematics

Year:

1992

Language:

english

File:

PDF, 281 KB

english, 1992

27

Asymptotic Expansion of the Waiting Time Distribution of Two Models of a Closed Processor-Sharing System: Heavy Usage

Barbagallo, Roberto, Mochi, Marina, Zirilli, Francesco

Journal:

SIAM Journal on Applied Mathematics

Year:

1994

Language:

english

File:

PDF, 1.70 MB

english, 1994

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Improving the performance of the actinic inspection tool with an optimized alignment procedure

Mochi, Iacopo, Schellenberg, Frank M., La Fontaine, Bruno M., Goldberg, Kenneth A., Naulleau, Patrick, Huh, Sungmin

Year:

2009

Language:

english

File:

PDF, 1.87 MB

english, 2009

29

High-precision CTE measurement of aluminum-alloys for cryogenic astronomical instrumentation

I. Mochi, S. Gennari, E. Oliva, C. Baffa, V. Biliotti, G. Falcini, E. Giani, G. Marcucci, M. Sozzi, L. Origlia, E. Rossetti, M. Gonzalez

Journal:

Experimental Astronomy

Year:

2009

Language:

english

File:

PDF, 288 KB

english, 2009

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Commissioning an EUV mask microscope for lithography generations reaching 8 nm

Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus, Allezy, Arnaud P., Dickinson, Michael R., Cork, Carl W., Zehm, Daniel, Macdougall, James B., Anderson, Erik, Salmassi, Farhad, Chao, Weilun L., Vytla

Year:

2013

Language:

english

File:

PDF, 2.08 MB

english, 2013

31

-wave propagation: Energy localization and velocity

Mugnai, D., Mochi, I.

Journal:

Physical Review E

Year:

2006

Language:

english

File:

PDF, 331 KB

english, 2006

32

Asymptotic Expansion of the Waiting Time Distribution of Two Models of a Closed Processor-Sharing System: Heavy Usage

Roberto Barbagallo, Marina Mochi and Francesco Zirilli

Journal:

SIAM Journal on Applied Mathematics

Year:

1994

Language:

english

File:

PDF, 1.42 MB

english, 1994

33

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch

Huh, Sungmin, Behringer, Uwe F. W., Kearney, Patrick, Wurm, Stefan, Goodwin, Frank, Han, Hakseung, Goldberg, Kenneth, Mochi, Iacopo, Gullikson, Eric

Year:

2009

Language:

english

File:

PDF, 810 KB

english, 2009

34

Individual Creativity in the Workplace || Interruptions and Multitasking: Advantages and Disadvantages for Creativity at Work

Mochi, Francesca

Year:

2018

Language:

english

File:

PDF, 213 KB

english, 2018

35

Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

Yamazoe, Kenji, Mochi, Iacopo, Goldberg, Kenneth A.

Journal:

Journal of the Optical Society of America A

Year:

2014

Language:

english

File:

PDF, 1.02 MB

english, 2014

36

Lensless EUV Lithography and Imaging

Mochi, Iacopo, Ekinci, Yasin

Journal:

Synchrotron Radiation News

Year:

2019

Language:

english

File:

PDF, 1.50 MB

english, 2019

37

Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging

Helfenstein, Patrick, Rajeev, Rajendran, Mochi, Iacopo, Kleibert, Armin, Vaz, C. A. F., Ekinci, Yasin

Journal:

Year:

2018

Language:

english

File:

PDF, 10.38 MB

english, 2018

38

Vascular changes precede tomographic changes in diabetic eyes without retinopathy and improve artificial intelligence diagnostics

Govindaswamy, Nivedhitha, Ratra, Dhanashree, Dalan, Daleena, Doralli, Subashchandra, Tirumalai, Anirudha A., Nagarajan, Rajesh, Mochi, Thirumalesh, Shetty, Naren, Roy, Abhijit Sinha

Journal:

Journal of Biophotonics

Year:

2020

File:

PDF, 5.92 MB

2020

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Assist features: placement, impact, and relevance for EUV imaging

Panning, Eric M., Goldberg, Kenneth A., Mochi, Iacopo, Philipsen, Vicky, Gallagher, Emily, Hendrickx, Eric, Lyakhova, Kateryna, Wittebrood, Friso, Schiffelers, Guido, Fliervoet, Timon, Wang, Shibing,

Year:

2016

Language:

english

File:

PDF, 4.19 MB

english, 2016

40

Autoimmunity during alpha-interferon therapy for chronic hepatitis C

M. Yoshikawa, T. Sakamoto, A. MitorO, T. Mochi, H. Tsujii, M. Koizumi, H. Yoshiji, Y. Sakaguchi, H. Fukui, H. Nakano, T. Tsujii

Journal:

Journal of Gastroenterology

Year:

1993

Language:

english

File:

PDF, 1010 KB

english, 1993

41

Analysis of Trichophyton antigen-induced contact hypersensitivity in mouse

Nakamura, Tomoya, Nishibu, Akiko, Yasoshima, Mitsue, Tanoue, Chiaki, Yoshida, Naoki, Hatta, Junko, Miyamoto, Takayuki, Nishii, Masahiro, Yanagibashi, Tsutomu, Nagai, Yoshinori, Takatsu, Kiyoshi, Mochi

Journal:

Journal of Dermatological Science

Year:

2012

Language:

english

File:

PDF, 1.36 MB

english, 2012

42

Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research

K. A. Goldberg, I. Mochi

Year:

2010

Language:

english

File:

PDF, 677 KB

english, 2010

43

Improvement in the High-Fat Diet-Induced Dyslipidemia and Adiponectin Levels by Fish Oil Feeding Combined with Food Restriction in Obese KKAy Mice

WAKUTSU, Masaki, TSUNODA, Nobuyo, MOCHI, Yasuki, NUMAJIRI, Mitsuki, SHIBA, Sachiko, MURAKI, Etsuko, KASONO, Keizo

Journal:

Bioscience Biotechnology and Biochemistry

Year:

2012

Language:

english

File:

PDF, 95 KB

english, 2012

44

Actinic characterization of extreme ultraviolet bump-type phase defects

K. A. Goldberg, I. Mochi

Year:

2011

Language:

english

File:

PDF, 983 KB

english, 2011

45

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Printability of native blank defects and programmed defects and their stack structures

Kwon, Hyuk Joo, Maurer, Wilhelm, Abboud, Frank E., Harris-Jones, Jenah, Teki, Ranganath, Cordes, Aaron, Nakajima, Toshio, Mochi, Iacopo, Goldberg, Kenneth A., Yamaguchi, Yuya, Kinoshita, Hiroo

Year:

2011

Language:

english

File:

PDF, 2.80 MB

english, 2011

46

Pathogenicity of Metarhizium anisopliae for Ceratitis capitata (Wied.) (Diptera: Tephritidae) in soil with different pesticides.

Mochi, Dinalva a., Monteiro, Antonio C., {De Bortoli}, Sergio a., Dória, Háyda O.S., Barbosa, José C.

Journal:

Neotropical Entomology

Year:

2006

File:

PDF, 65 KB

2006

47

Hydrophilic silver nanoparticles with tunable optical properties: application for the detection of heavy metals in water

Prosposito, Paolo, Mochi, Federico, Ciotta, Erica, Casalboni, Mauro, De Matteis, Fabio, Venditti, Iole, Fontana, Laura, Testa, Giovanna, Fratoddi, Ilaria

Journal:

Beilstein Journal of Nanotechnology

Year:

2016

Language:

english

File:

PDF, 1.26 MB

english, 2016

48

A Simple way to Prevent Indocyanine Green from Entering the Subretinal Space during Vitrectomy for Retinal Detachment Due to Myopic Macular Hole

Facino, M., Mochi, B., Lai, S., Terrile, R.

Journal:

European Journal of Ophthalmology

Year:

2004

Language:

english

File:

PDF, 154 KB

english, 2004

49

Selection of anti-wetting agents and photoprotectants compatible with a soybean weed control bioagent

Machado, A. C. R., Monteiro, A. C., Mochi, D. A.

Journal:

African Journal of Microbiology Research

Year:

2016

Language:

english

File:

PDF, 268 KB

english, 2016

50

The dissociation of human deoxyhemoglobin and mixed state hemoglobin into monomer

S. Tomita, Y. Enoki, T. Mochi, T. Watanabe

Journal:

Biochimica et Biophysica Acta (BBA) - Protein Structure

Year:

1976

Language:

english

File:

PDF, 533 KB

english, 1976

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